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High-power x-ray point source for next-generation lithography

Author(s):
Turcu,I.C.E. ( JMAR Technologies Inc. )
Forber,R.A.
Grygier,R.K.
Rieger,H.
Powers,M.F.
Campeau,S.
French,G.
Foster,R.M.
Mitchell,P.V.
Gaeta,C.J.
Cheng,Z.
Burdett,J.
Gibson,D.M.
Lane,S.M.
Mrowka,S.J.
Maldonado,J.R.
11 more
Publication title:
EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3767
Pub. Year:
1999
Page(from):
21
Page(to):
32
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432537 [0819432539]
Language:
English
Call no.:
P63600/3767
Type:
Conference Proceedings

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