Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I

Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I

Author(s):

Socha,R.J. ( National Semiconductor Corp. )

Publication title:

18th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3546

Pub. Year:

1998

Page(from):

617

Page(to):

641

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819430076 [0819430072]

Language:

English

Call no.:

P63600/3546

Type:

Conference Proceedings

Details

TDL ID:	ZA00019916
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1998 : 18th
Conf. info. (Venue):	Redwood City, California, USA
Conf. info. (Date):	1998.09.16-1998.09.18

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