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Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist

Author(s):
Chen,F. ( Intel Corp. )
Tsai,W.
Chegwidden,S.
Yu,S.
Kamna,M.
Farnsworth,J.N.
Coleman,T.P.
2 more
Publication title:
18th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3546
Pub. Year:
1998
Page(from):
429
Page(to):
437
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819430076 [0819430072]
Language:
English
Call no.:
P63600/3546
Type:
Conference Proceedings

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