Making high-performance scattering-bar OPC masks with vector-scan,variable-shaped e-beam,and raster-scan laser mask writers

Making high-performance scattering-bar OPC masks with vector-scan,variable-shaped e-beam,and raster-scan laser mask writers

Author(s):

Lu,H.H. ( Innova Inc. )

Publication title:

18th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3546

Pub. Year:

1998

Page(from):

368

Page(to):

382

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819430076 [0819430072]

Language:

English

Call no.:

P63600/3546

Type:

Conference Proceedings

Details

TDL ID:	ZA00019916
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1998 : 18th
Conf. info. (Venue):	Redwood City, California, USA
Conf. info. (Date):	1998.09.16-1998.09.18

Similar Items:

1 Conference Proceedings Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems Nakagawa, K. H., Chen, J. F., Socha, R. J., Laidig, T. L., Wampler, K. E., Van Den Broeke, D., Dusa, M. V., Caldwell, R. … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Advantages of variable-shaped e-beam writers for mask making Ehrlich,C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F., Nakagawa,K.H., Liebchen,A. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Practical method for full-chip optical proximity correction Chen,J.F., Laidig,T., Wampler,K.E., Caldwell,R. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I Socha,R.J., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Eigen-decomposition-based models for model OPC Shi, X., Laidig, T.L., Chen, J.F., Van Den Broeke, D.J., Hsu, S.D., Hsu, M., Wampler, K.E., Hollerbach, U. SPIE - The International Society of Optical Engineering
4 Conference Proceedings OPC technology road map to 0.14-ｦﾌm design rules Chen,J.F., Laidig,L., Wampler,K.E., Caldwell,R.F., Naderi,A.R., Van Den Broeke,D. SPIE-The International Society for Optical Engineering	10 Conference Proceedings CD error sensitivity to "sub-killer" defects at k1 near 0.4:II Nakagawa,K.H., Chen,J.F., Socha,R.J., Dusa,M.V., Laidig,T.L., Wampler,K.E., Caldwell,R.F., Broeke,D.J.van den SPIE - The International Society for Optical Engineering
5 Conference Proceedings Investigation of model OPC optimization based on CD uniformity yield Roy, S., Chen, J.F., Liebchen, A., Laidig, T.L., Wampler, K.E., Hollerbach, U. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results Socha,R.J., Shi,X., Holman,K.C., Dusa,M.V., Conley,W., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Manufacturing an advanced process characterization reticle incorporating halftone biasing Nakagawa,K.H., Broeke,D.Van Den, Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Raster scan patterning solution for 100-and 70-nm OPC masks Abboud, F.E., Baik, K.-H., Chakarian, V., Cole, D. M., Dean, R.L., Gesley M.A., Gillman. H., Moore, W.C., Mueller, M., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12