New MEBES pattern generator

New MEBES pattern generator

Author(s):

Chabala,J.M. ( Etec Systems,Inc. )
Abboud,F.E.
Weaver,S.
Cole,D.M.

Publication title:

18th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3546

Pub. Year:

1998

Page(from):

74

Page(to):

85

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819430076 [0819430072]

Language:

English

Call no.:

P63600/3546

Type:

Conference Proceedings

Details

TDL ID:	ZA00019916
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1998 : 18th
Conf. info. (Venue):	Redwood City, California, USA
Conf. info. (Date):	1998.09.16-1998.09.18

Similar Items:

1 Conference Proceedings Lithography and CD performance of advanced MEBES mask pattern generators Chabala,J.M., Cole,D.M., Pearce-Percy,H.T., Phillips,W., Lu,M., Weaver,S., Alexander,D., Coleman,T., Sauer,C.A., … SPIE - The International Society for Optical Engineering	7 Conference Proceedings Investigation of lithography performance using multipass gray(MPG)with MEBES 5000 Dean,R.L., Alexander,D., Chabala,J.M., Coleman,T., Hartglass,C., Lu,M., Sauer,C.A., Weaver,S. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation Chabala,J.M., Abboud,F.E., Dean,R.L., Weaver,S., Cole,D.M., Sauer,C.A., F.Raymond ?, Hofmann,U. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Evaluation of OPC mask printing with a raster scan pattern generator Newman, T.H., Chabala, J.M., Marleau, B.J., Raymond, F., III, Toublan, O., Gesley, M.A., Abboud, F.E. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation Chabala,J.M., Weaver,S., Alexander,D., Pearce-Percy,H.T., Lu,M., Cole,D.M., Abboud,F.E. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Lithography performance of contact holes:I.Optimization of Pattern fidelity using MPG and MPG-II Weaver,S., Lu,M., Chabala,J.M., Ton,D., Sauer,C.A., MAck,C.A. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Reduction of beam-induced pattern placement errors in MEBES systems Alexander,D., Veneklasen,L., Weaver,S., Varner,J.K., Cole,D.M. SPIE - The International Society for Optical Engineering	10 Conference Proceedings 100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology Abboud,F.E., Baik,K.-H., Chakarian,V., Cole,D.M., Daniel,J.P., Dean,R.L., Gesley,M.A., Lu,M., Naber,R.J., Newman,T.H., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Extension of graybeam writing for the 130-nm technology node Chabala,J.M., Abboud,F.E., Sauer,C.A., Weaver,S., Lu,M., Pearce-Percy,H.T., Hofmann,U., Vernon,M., Ton,D., Cole,D.M., … SPIE - The International Society for Optical Engineering	11 Conference Proceedings Multipass gray printing for a new MEBES 4500S mask lithography system Abboud,F.E., Dean,R.L., Doering,J.J., Eckes,W., Gesley,M.A., Hofmann,U., Mulera,T., Naber,R.J., Pastor,M., Phillips,W., … SPIE-The International Society for Optical Engineering
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