Development of a next-generation e-beam lithography system
- Author(s):
- Nakagawa,Y. ( JEOL Ltd. )
- Komagata,T.
- Takemura,H.
- Gotoh,N.
- Tanaka,K.
- Publication title:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3546
- Pub. Year:
- 1998
- Page(from):
- 45
- Page(to):
- 54
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- Language:
- English
- Call no.:
- P63600/3546
- Type:
- Conference Proceedings
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