Blank Cover Image

Chemical vapor deposition of conformal alumina thin films

Author(s):
Publication title:
Chemical processing of dielectrics, insulators and electronic ceramics : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
606
Pub. Year:
2000
Page(from):
75
Pub. info.:
Warrendale: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995147 [1558995145]
Language:
English
Call no.:
M23500/606
Type:
Conference Proceedings

Similar Items:

Stupik, Paul D., Cheatham, Linda K., Graha, John J., Barron, Andrew R. Barron

Materials Research Society

Gradinetti, G., Shanmugham, S., Hendrick, M. R., Hampikian, J. M.

MRS-Materials Research Society

Power, Michael B., MacInnes, Andrew N., Hepp, Aloysius F., Barron, Andrew R.

Materials Research Society

Julia K.C. Abbott, J. Daniel Brasfield, Philip D. Rack, Gerd J. Duscher, Charles S. Feigerle

Materials Research Society

Bahlawane, Naoufal, Blittersdorf, Sabine, Kohse-Hoinghaus, Katharina, Atakan, Burak, Muller, Jurgen

Materials Research Society

Wang, C:, Bjorkman, C.H., Lee, D.R., Williams, M.J., Lucovsky, G.

Materials Research Society

Xiao, T.D., Strutt, P.R.

Materials Research Society

Narine R. Malkhasyan, Daniel D. Burkey

American Institute of Chemical Engineers

Lin, W-Y., Huang, H., Cullen, D. K., Shoup, S. S., Cousins, D., Schmitt, J. J., Hunt, A. T., Romanofsky, R. R., …

MRS-Materials Research Society

Laura Bradley, Malancha Gupta

American Institute of Chemical Engineers

Wessels, B.W., Wills, L.A., Lu, H.A., Gilbert, S.R., Neumayer, D.A., Schulz, D.L., Marks, T.J.

Electrochemical Society

Lucovsky, G., Lu, Z., Lee, D.R.

American Institute of Chemical Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12