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Deposition of SiO2:F:C films with low dielectric constant and with high resistance to annealing

Author(s):
Publication title:
Chemical processing of dielectrics, insulators and electronic ceramics : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
606
Pub. Year:
2000
Page(from):
57
Pub. info.:
Warrendale: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995147 [1558995145]
Language:
English
Call no.:
M23500/606
Type:
Conference Proceedings

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