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Thermal Stability of Fluorinated SiO2 Films: Effects of Hydration and Film-Substrate Interaction

Author(s):
Sullivan, J. P.
Denison, D. R.
Barbour, J. C.
Newcomer, P. P.
Apblett, C. A.
Seager, C. H.
Baca, A. G.
2 more
Publication title:
Low-dielectric constant materials II : symposium held December 2-3, 1996, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
443
Pub. Year:
1997
Page(from):
149
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993471 [1558993479]
Language:
English
Call no.:
M23500/443
Type:
Conference Proceedings

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