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Effect of Fluorine Addition to Plasma-Enhanced Chemical Vapor Deposition Silicon Oxide Film

Author(s):
Lim, S. W.
Miyata, M.
Naito, T.
Shimogaki, Y.
Nakano, Y.
Tada, K.
Komiyama, H.
2 more
Publication title:
Low-dielectric constant materials II : symposium held December 2-3, 1996, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
443
Pub. Year:
1997
Page(from):
143
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993471 [1558993479]
Language:
English
Call no.:
M23500/443
Type:
Conference Proceedings

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