Dependence of Composition and Microstructure of RuOx Films on Target Status and Substrate Temperature in Reactive Sputtering Deposition

Dependence of Composition and Microstructure of RuOx Films on Target Status and Substrate Temperature in Reactive Sputtering Deposition

Author(s):

Publication title:

Ferroelectric thin films V : symposium held April 7-12, 1996, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

433

Pub. Year:

1996

Page(from):

151

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993365 [1558993363]

Language:

English

Call no.:

M23500/433

Type:

Conference Proceedings

Details

TDL ID:	ZA00019837
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ferroelectric thin films
Conf. info. (Number):	5th
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1996.04.07-1996.04.12

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