Rapid Thermal Annealing of Tungsten Silicide Films
- Author(s):
- Publication title:
- Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 402
- Pub. Year:
- 1996
- Page(from):
- 625
- Pub. info.:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- Language:
- English
- Call no.:
- M23500/402
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Analysis of Reflection High Energy Electron Diffraction Pattern of Silicon Carbide Grown on Silicon
MRS - Materials Research Society |
7
Conference Proceedings
Structural Investigations of the Nucleation and Growth of SiC during Rapid Thermal Conversion of (111)Si
Trans Tech Publications |
MRS - Materials Research Society |
North-Holland |
Materials Research Society |
Materials Research Society |
4
Conference Proceedings
High-Resolution XRD Investigations of the Strain Reduction in 3C-SiC Thin Films Grown on Si (111) Substrates
Trans Tech Publications |
10
Conference Proceedings
EPITAXIAL GROWTH OF NEAR NOBLE SILICIDES ON (111)Si BY RAPID THERMAL ANNEALING
Materials Research Society |
Trans Tech Publications |
Materials Research Society |
6
Conference Proceedings
Preparation of conductive tungsten carbide layers for SiC high-temperature applications
MRS-Materials Research Society |
Materials Research Society |