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Influence of Stoichiometric Variations and Rapid Thermal Processing of β-FeSi2 Thin Films on Their Electrical and Microstructural Properties

Author(s):
Doscher, M.
Selle, B.
Pauli, M.
Kothe, F.
Szymanski, J.
Muller, J.
Lange, H.
2 more
Publication title:
Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
402
Pub. Year:
1996
Page(from):
325
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993051 [1558993053]
Language:
English
Call no.:
M23500/402
Type:
Conference Proceedings

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