Process Windows of Nickel and Platinum Silicides in Deep Sub-Micron Regime
- Author(s):
- Publication title:
- Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 402
- Pub. Year:
- 1996
- Page(from):
- 59
- Pub. info.:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- Language:
- English
- Call no.:
- M23500/402
- Type:
- Conference Proceedings
Similar Items:
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
8
Conference Proceedings
Dry Etching of Sub-Micron Emitter in InP Heterojunction Double Bipolar Transistor Using Inductively Coupled Plasma
Electrochemical Society |
3
Conference Proceedings
Process Windows of Titanium, Cobalt and Nickel Silicide in Deep Submicron Poly-Si Lines
MRS - Materials Research Society |
9
Conference Proceedings
Dielectric CMP Planarization Considerations for Deep Sub-Micron Multilevel Interconnect Processes
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
5
Conference Proceedings
Titanium Self-Aligned Silicide Process Fabrication Issues for Deep Sub-Micron CMOS Devices
Narosa Publishing House |
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
12
Conference Proceedings
MSTAR: an absolute metrology sensor with sub-micron accuracy for space-based applications
ESA Publications Division |