Process development for 180-nm structures using interferometric lithography and i-line photoresist

Process development for 180-nm structures using interferometric lithography and i-line photoresist

Author(s):

Publication title:

Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3048

Pub. Year:

1997

Page(from):

309

Page(to):

318

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424624 [0819424625]

Language:

English

Call no.:

P63600/3048

Type:

Conference Proceedings

Details

TDL ID:	ZA00019826
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	1997
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.11

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