Interferometric lithography exposure tool for 180-nm structures

Interferometric lithography exposure tool for 180-nm structures

Author(s):

Zaidi,S.H. ( Univ.of New Mexico )

Publication title:

Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3048

Pub. Year:

1997

Page(from):

248

Page(to):

254

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424624 [0819424625]

Language:

English

Call no.:

P63600/3048

Type:

Conference Proceedings

Details

TDL ID:	ZA00019826
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	1997
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.11

Similar Items:

1 Conference Proceedings Nanoscale fabrication by interferometric lithography Zaidi,S.H., Brueck,S.R.J. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Room Temperature Photoluminescence from Manufactured 1-D Si Grating Structures Zaidi, S.H., Chu, A-S., Brueck, S.R.J. Electrochemical Society
2 Conference Proceedings Interferometric lithography for nanoscale fabrication Zaidi,S.H., Brueck,S.R.J. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Imaging interferometric lithography:extending optics to fundamental limits and beyond Brueck,S.R.J. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Nonlinear processes to extend interferometric lithography Zaidi,S.H., Brueck,S.R.J. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Extension of 193-nm immersion optical lithography to the 22-nm half-pitch node Brueck, S.R.J., Biswas, A.M. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Mix-and-match interferometric and optical lithographies for nanoscale structures Zaidi,S.H., Brueck,S.R.J., Hill,T.A., Shagam,R.N. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Imaging interferometric lithography for arbitrary patterns Chen,X., Brueck,S.R.J. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Process development for 180-nm structures using interferometric lithography and i-line photoresist Chen,X., Zhang,Z., Brueck,S.R.J., Carpio,R.A., Petersen,J.S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Deep-UV immersion interferometric lithography Raub, A.K., Frauenglass, A., Brueck, S.R.J., Conley, W., Dammel, R.R., Romano, A., Sato, M., Hinsberg, W. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Deep UV immersion interferometric lithography Raub, A.K., Brueck, S.R.J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Simulation of the 45-nm half-pitch node with 193-nm immersion lithography Biswas, A.M., Frauenglass, A., Brueck, S.R.J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12