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Scattered-light alignment system using SiC mask for x-ray lithography

Author(s):
Publication title:
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3048
Pub. Year:
1997
Page(from):
225
Page(to):
236
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424624 [0819424625]
Language:
English
Call no.:
P63600/3048
Type:
Conference Proceedings

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