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Benchmarking multimode CD-SEM metrology to 180 nm

Author(s):
Monahan,K.M. ( KLA Instruments Corp. )
Askary,F.
Elliott,R.C.
Forcier,R.A.
Quattrini,R.
Sheumaker,B.L.
Yee,J.C.
Marchman,H.M.
Bennett,R.D.
Carlson,S.D.
Sewell,H.
McCafferty,D.C.
Sumra,J.
Yan,J.
9 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2725
Pub. Year:
1996
Page(from):
480
Page(to):
493
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421012 [0819421014]
Language:
English
Call no.:
P63600/2725
Type:
Conference Proceedings

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