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Compensation of intrafield registration error caused by process properties in optical lithography

Author(s):
Lee,T.-G. ( Hyundai Electronics Industries Co.,Ltd. )
Moon,S.-C.
Lee,H.-M.
Kim,J.-S.
Lee,C.-S.
Kim,H.-Y.
Park,H.-K.
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2725
Pub. Year:
1996
Page(from):
365
Page(to):
378
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421012 [0819421014]
Language:
English
Call no.:
P63600/2725
Type:
Conference Proceedings

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