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Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution

Author(s):
Publication title:
Metrology, Inspection, and Process Control for Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2725
Pub. Year:
1996
Page(from):
85
Page(to):
93
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421012 [0819421014]
Language:
English
Call no.:
P63600/2725
Type:
Conference Proceedings

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