Dimension-temperature combination scaling for low-temperature 0.1-ヲフm CMOS
- Author(s):
- Masu,K. ( Tohoku Univ. )
- Yokoyama,M.
- Tsubouchi,K.
- Publication title:
- Microelectronic Device and Multilevel Interconnection Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2636
- Pub. Year:
- 1995
- Page(from):
- 62
- Page(to):
- 73
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420022 [0819420026]
- Language:
- English
- Call no.:
- P63600/2636
- Type:
- Conference Proceedings
Similar Items:
MRS - Materials Research Society |
7
Conference Proceedings
Impact of the Coulomb interaction effect on delineating densely repeated 0.1-ヲフm patterns using electron-beam block exposure
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Response-surface-based optimization of 0.1-ヲフm PMOSFETs with ultrathin gate stack dielectrics
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
11
Conference Proceedings
Self-heating as a tool for measuring sub-0.1-ヲフm silicon-on-insulator device parameters
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
12
Conference Proceedings
Mix-and-match lithography processes for 0.1-ヲフm MOS transistor device fabrication
SPIE-The International Society for Optical Engineering |