Plasma charging effects on device degradation from via sputter etch
- Author(s):
Vishnubhotla,L. ( SGS-Thomson Microelectronics,Inc. ) Ling,J. Huang,J. Wu,Y. Smith,G. Zamanian,M. Liou,F.-T. Ashtiani,K.A. Nicholas,M.D.Mc - Publication title:
- Microelectronic Device and Multilevel Interconnection Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2636
- Pub. Year:
- 1995
- Page(from):
- 44
- Page(to):
- 51
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420022 [0819420026]
- Language:
- English
- Call no.:
- P63600/2636
- Type:
- Conference Proceedings
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