Alkane Plasma Etching of Gallium Arsenide
- Author(s):
- Publication title:
- Plasma properties, deposition and etching
- Title of ser.:
- Materials science forum
- Ser. no.:
- 140-142
- Pub. Year:
- 1993
- Page(from):
- 659
- Page(to):
- 688
- Pub. info.:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9780878496709 [087849670X]
- Language:
- English
- Call no.:
- M23650
- Type:
- Conference Proceedings
Similar Items:
MRS - Materials Research Society |
7
Conference Proceedings
Aspects of One Dimensional Transport Effects in Gallium Arsenide Heterojunvtion Structures
Plenum Press |
Materials Research Society |
Materials Research Society |
Electrochemical Society |
9
Conference Proceedings
ASSESSMENT OF SURFACE DAMAGE OF GALLIUM ARSENIDE DUE TO REACTIVE ION ETCHING
Materials Research Society |
North-Holland |
10
Conference Proceedings
FS Spectroscopy of Phonon Emission and Absorption for a Cold Plasma in Gallium Arsenide
MRS - Materials Research Society |
MRS - Materials Research Society |
11
Conference Proceedings
OPTICAL, CHEMICAL AND ELECTRICAL CHARACTERIZATION OF ION-ETCHED GALLIUM ARSENIDE SURFACES
Materials Research Society |
Materials Research Society |
Trans Tech Publications |