Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Author(s):

Publication title:

Plasma properties, deposition and etching

Title of ser.:

Materials science forum

Ser. no.:

140-142

Pub. Year:

1993

Page(from):

255

Page(to):

268

Pub. info.:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496709 [087849670X]

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00019749
Series ID:	PA00000012

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