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PECVD of Silicon Dioxide from TEOS/Oxygen Mixtures

Author(s):
Publication title:
Plasma properties, deposition and etching
Title of ser.:
Materials science forum
Ser. no.:
140-142
Pub. Year:
1993
Page(from):
1
Page(to):
16
Pub. info.:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878496709 [087849670X]
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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