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Noncontact surface potential measurements for charging reduction during TEOS deposition and ion implantation

Author(s):
Publication title:
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3509
Pub. Year:
1998
Page(from):
115
Page(to):
124
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780081942963 [0081942968]
Language:
English
Call no.:
P63600/3509
Type:
Conference Proceedings

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