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Ripple formation in excimer laser-irradiated silicon dioxide/silicon system

Author(s):
  • Yu,J.J. ( National Univ.of Singapore )
  • Lu,Y.F. ( National Univ.of Singapore )
Publication title:
Laser processing of materials and industrial applications II : 16-19 September 1998, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3550
Pub. Year:
1998
Page(from):
262
Page(to):
268
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819430113 [0819430110]
Language:
English
Call no.:
P63600/3550
Type:
Conference Proceedings

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