Growth and characterization of ~-FeSi2 thin films prepared by laser ablation method (Invited Paper)

Growth and characterization of ~-FeSi2 thin films prepared by laser ablation method (Invited Paper)

Author(s):

Kakemoto,H. ( Electrotechnical Lab. (Japan) and Science Univ.of Tokyo (Japan) )

Makita,Y. ( Electrotechnical Lab. (Japan) )

Sakuragi,S. ( Union Material Inc. (Japan) )

Show,Y. ( Tokai Univ.(Japan) )

Izumi,T. ( Tokai Univ.(Japan) )

Sakata,I. ( Electrotechnical Lab. (Japan) )

Obara,A. ( Electrotechnical Lab. (Japan) )

Kobayashi,N. ( Electrotechnical Lab. (Japan) )

Ando,S. ( Science Univ.of Tokyo (japan) )

Tsukamoto,T. ( Science Univ.of Tokyo (japan) )

5 more

Publication title:

Laser processing of materials and industrial applications II : 16-19 September 1998, Beijing, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3550

Pub. Year:

1998

Page(from):

129

Page(to):

140

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819430113 [0819430110]

Language:

English

Call no.:

P63600/3550

Type:

Conference Proceedings

Details

TDL ID:	ZA00019697
Series ID:	PA00000029
Conf. info. (Name):	Photonics China : Laser Processing of Materials and Industrial Applications
Conf. info. (Number):	1998 : 2nd
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	1998.09.16-1998.09.19

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