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Investigation of lithography performance using multipass gray(MPG)with MEBES 5000

Author(s):
Dean,R.L. ( Etec Systems,Inc. )
Alexander,D.
Chabala,J.M.
Coleman,T.
Hartglass,C.
Lu,M.
Sauer,C.A.
Weaver,S.
3 more
Publication title:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3665
Pub. Year:
1999
Page(from):
166
Page(to):
178
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431394 [0819431397]
Language:
English
Call no.:
P63600/3665
Type:
Conference Proceedings

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