Manufacturing an advanced process characterization reticle incorporating halftone biasing
- Author(s):
Nakagawa,K.H. ( Photronics,Inc. ) Broeke,D.Van Den Chen,J.F. Laidig,T.L. Wampler,K.E. Caldwell,R.F. - Publication title:
- 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3665
- Pub. Year:
- 1999
- Page(from):
- 129
- Page(to):
- 134
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431394 [0819431397]
- Language:
- English
- Call no.:
- P63600/3665
- Type:
- Conference Proceedings
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