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Results from submicron CD metrology obtained with new I-line tools

Author(s):
Bruck,H.-J. ( MueTec GmbH )
Birkenmayer,S.
Falk,G.
Scheuring,G.
Walden,L.
Lehnigk,S.
1 more
Publication title:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3665
Pub. Year:
1999
Page(from):
76
Page(to):
86
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431394 [0819431397]
Language:
English
Call no.:
P63600/3665
Type:
Conference Proceedings

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