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PN and SOI wafer flow process for stencil mask fabrication

Author(s):
Butschke,J. ( Institut fur Mikroelektronik/Stuttgart )
Ehrmann,A.
Haugeneder,E.
Irmscher,M.
Kasmaier,R.
Kragler,K.
Letzkus,F.
Loschner,H.
Mathuni,J.
Rangelow,I.W.
Reuter,C.
Shi,F.
Springer,R.
8 more
Publication title:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3665
Pub. Year:
1999
Page(from):
20
Page(to):
29
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431394 [0819431397]
Language:
English
Call no.:
P63600/3665
Type:
Conference Proceedings

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