Progress in 157-nm lithography development at Intel:resists and reticles
- Author(s):
Rao,V. ( Intel Corp. ) Panning,E.M. Liao,L. Hutchinson,J.M. Grenville,A. Holl,S.M. Bruner,D. Balasubramanian,R. Kuse,R. Dao,G.T. Zheng,J.-F. Orvek,K.J. Langston,J.C. Lo,F.-C. - Publication title:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4000
- Pub. Year:
- 2000
- Vol.:
- Part2
- Page(from):
- 1574
- Page(to):
- 1581
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- Language:
- English
- Call no.:
- P63600/4000
- Type:
- Conference Proceedings
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