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Progress in 157-nm lithography development at Intel:resists and reticles

Author(s):
Rao,V. ( Intel Corp. )
Panning,E.M.
Liao,L.
Hutchinson,J.M.
Grenville,A.
Holl,S.M.
Bruner,D.
Balasubramanian,R.
Kuse,R.
Dao,G.T.
Zheng,J.-F.
Orvek,K.J.
Langston,J.C.
Lo,F.-C.
9 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part2
Page(from):
1574
Page(to):
1581
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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