Feasibility of highly line-narrowed F2 laser for 157-nm microlithography

Feasibility of highly line-narrowed F2 laser for 157-nm microlithography

Author(s):

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part2

Page(from):

1529

Page(to):

1536

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings ArF lasers for production of semiconductor devices with CD <0.15 ｦﾌm Duffey,T.P., Embree,T.J., Ishihara,T., Morton,R.G., Partlo,W.N., Watson,T.A., Sandstrom,R.L. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Advanced VUV spectrometer for F2 laser metrology Onkels,E., Rylov,G., Sandstrom,R.L. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-ｦﾌm line widths Ershov,A.I., Hofmann,T., Partlo,W.N., Fomenkov,I.V., Everage,G., Das,P.P., Myers,D. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography Morton,R.G., Fomenkov,I.V., Partlo,W.N., Das,P.P., Sandstrom,R.L. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Dependence of compaction in fused silica on laser pulsewidth at 248 nm Sandstrom,R.L., Morton,R.G., Duffey,T.P. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Ultra-line-narrowed F2 laser for microlithography Komori,H., Ariga,T., Watanabe,H., Kumazaki,T., Kitatochi,N., Sasano,K., Ueno,Y., Nishisaka,T., Nohdomi,R., Hotta,K., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Low cost of ownership KrF excimer laser using a novel pulse power and chamber configuration W.N. Partlo, R.L. Sandstrom, I.V. Fomenkov, P.P. Das Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Performance of very high repetition rate ArF lasers Hueber,J.-M., Besaucele,H., Das,P.P., Eis,R., Ershov,A.I., Fleurov,V.B., Gaidarenko,D., Hofmann,T., Melcher,P.C., … SPIE - The International Society for Optical Engineering
5 Conference Proceedings Comparison of ArF and KrF laser performance at 2 kHz for microlithography Besaucele,H., Das,P.P., Duffey,T.P., Embree,T.J., Ershov,A.I., Fleurov,V.B., Grove,S.L., Melcher,P.C., Ness,R., … SPIE - The International Society for Optical Engineering	11 Conference Proceedings Advances in resists for 157-nm microlithography Trinque, B.C., Osborn, B.P., Chambers, C.R., Hsieh, Y.-T., Corry, S.B., Chiba, T., Hung, R.J., Tran, H.V., Zimmerman, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Compaction and rarefaction of fused silica with 193-nm excimer laser exposure Algots, J.M., Sandstrom, R., Partlo, W.N., Maroevic, P., Eva, E., Gerhard, M., Linder, R., Stietz, F. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Dissolution inhibitors for 157-nm microlithography Conley, W., Miller, D.A., Chambers, C.R., Osborn, B.P., Hung, R.J., Tran, H.V., Trinque, B.C., Pinnow, M.J., Chiba, T., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12