Output stabilization technology With chemical impurity control on ArF excimer laser | 東京工業大学附属図書館文献データベース

Blank Cover Image

Output stabilization technology With chemical impurity control on ArF excimer laser

Author(s):

Sumitani,A. ( Komatsu Ltd. )

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part2

Page(from):

1424

Page(to):

1434

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings High-repetition-rate ArF excimer laser for microlithography Wakabayashi,O., Enami,T., Ishii,K., Terashima,K., Itakura,Y., Watanabe,T., Ohta,T., Ohbu,A., Kubo,H., Tanaka,H., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography Saito,T., Matsunaga,T., Mitsuhashi,K., Terashima,K., Ohta,T., Tada,A., Ishihara,T., Yoshino,M., Tsushima,H., Enami,T., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Billion-level durable ArF excimer laser with highly stable energy Wakabayashi,O., Enami,T., Ohta,T., Tanaka,H., Kubo,H., Suzuki,T., Terashima,K., Sumitani,A., Mizoguchi,H. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography Hori, T., Yabu, T., Ishihara, T., Watanabe, T., Wakabayashi, O., Sumitani, A., Kakizaki, K., Mizoguchi, H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography Enami,T., Wakabayashi,O., Ishii,K., Terashima,K., Itakura,Y., Watanabe,T., Ohta,T., Ohbu,A., Kubo,H., Tanaka,H., … SPIE - The International Society for Optical Engineering	9 Conference Proceedings Performance of a highly stable 2-kHz-operation KrF Laser Enami,T., Nakano,M., Watanabe,T., Ohbo,A., Hori,T., Ito,T., Nishisaka,T., Sumitani,A., Wakabayashi,O., Mizoguchi,H., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings 1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage Enami,T., Ohta,T., Tanaka,H., Kubo,H., Suzuki,T., Sunaka,F., Terashima,K., Sumitani,A., Kawasa,Y., Wakabayashi,O., … SPIE - The International Society for Optical Engineering	10 Conference Proceedings Development of high-power ArF/F2 laser platform for VUV microlithography Kakizaki, K., Fujimoto, J., Yamazaki, T., Suzuki, T., Matsunaga, T., Kawasuji, Y., Watanabe, Y., Kaminishi, M., Inoue, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation Saito, T., Suzuki, T., Yoshino, M., Wakabayashi, O., Matsunaga, T., Fujimoto, J., Kakizaki, K., Yamazaki, T., Inoue, T., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge Enami,T., Wakabayashi,O., Nishisaka,T., Suzuki,N., Nire,T., Mizoguchi,H., Nakarai,H., Tanaka,H., Ariga,T., Shio,K., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Development of environmental control technologies for 157-nm lithography at ASET Fukuda, Y., Takeuchi, S., Aoki, T., Nagasaka, H., Owa, S., Yoshida, F., Kawasa, Y., Egawa, K., Watanabe, T., Uchino, I., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings High-power injection lock laser platform for ArF dry/wet lithography H. Mizoguchi, T. Inoue, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12