High-repetition-rate ArF excimer laser for 193-nm lithography

High-repetition-rate ArF excimer laser for 193-nm lithography

Author(s):

Kakizaki,K. ( Ushio Research Institute of Technology Inc. )

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part2

Page(from):

1397

Page(to):

1404

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings Line-narrowed ArF excimer laser for 193-nm lithography Saito,T., Mitsuhashi,K., Arai,M., Seki,K., Tada,A., Igarashi,T., Hotta,K. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation Saito, T., Suzuki, T., Yoshino, M., Wakabayashi, O., Matsunaga, T., Fujimoto, J., Kakizaki, K., Yamazaki, T., Inoue, T., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography Kakizaki,K., Matsunaga,T., Sasaki,Y., Inoue,T., Tanaka,S., Tada,A., Taniguchi,H., Arai,M., Igarashi,T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings High-repetition-rate ArF excimer laser for microlithography Wakabayashi,O., Enami,T., Ishii,K., Terashima,K., Itakura,Y., Watanabe,T., Ohta,T., Ohbu,A., Kubo,H., Tanaka,H., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography Saito,T., Matsunaga,T., Mitsuhashi,K., Terashima,K., Ohta,T., Tada,A., Ishihara,T., Yoshino,M., Tsushima,H., Enami,T., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Long pulse duration of F2 laser for 157-nm lithography Watanabe,H., Kitatochi,N., Kakizaki,K., Tada,A., Sakuma,J., Ariga,T., Hotta,K. SPIE-The International Society for Optical Engineering
4 Conference Proceedings High-repetition-rate excimer lasers for 193-nm lithography Zschocke, W., Albrecht, H.-S., Schroeder, T., Bragin, I., Lokai, P., Seddighi, F., Reusch, C., Cortona, A., Schmidt, K., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings High-repetition-rate ultranarrow-bandwidth 193-nm excimer lasers for DUV lithography Stamm,U., Patzel,R., Bragin,I., Kleinschmidt,J., Lokai,P., Osmanov,R., Schrbder,T., Sprenger,M., Zschocke,W. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography Matsunaga,T., Enami,T., Kakizaki,K., Saito,T., Tanaka,S., Nakarai,H., Inoue,T., Igarashi,T. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Compact ArF excimer lasers specific to microlithography and surgery Sekita,H., Yano,J., Tada,A., Tamegai,M., Yoshida,K., Kasamatsu,T., Ito,S., Saito,T., Ogura,Y. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography Hori, T., Yabu, T., Ishihara, T., Watanabe, T., Wakabayashi, O., Sumitani, A., Kakizaki, K., Mizoguchi, H. SPIE - The International Society of Optical Engineering	12 Conference Proceedings ArF excimer laser for 193-nm lithography Stamm,U., Patzel,R., Kleinschmidt,J., Vogler,K., Zschocke,W., Bragin,I., Basting,D. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12