Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning
- Author(s):
Hung,K.-C. ( United Silicon Inc. ) Lin,B.S.-M. Chang,H.-A. Tseng,A. Chung,L.-S. Liu,W.-J. Wu,D.-Y. Huang,P. - Publication title:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4000
- Pub. Year:
- 2000
- Vol.:
- Part2
- Page(from):
- 1371
- Page(to):
- 1378
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- Language:
- English
- Call no.:
- P63600/4000
- Type:
- Conference Proceedings
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