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Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Author(s):
Friedrich,C. ( Infineon Technologies AG )
Mader,L.
Erdmann,A.
List,S.
Gordon,R.L.
Kalus,C.K.
Griesinger,U.A.
Pforr,R.
Mathuni,J.
Ruhl,G.G.
Maurer,W.
6 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part2
Page(from):
1323
Page(to):
1335
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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