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Image shortening and process development in BEOL lithography

Author(s):
DellaGuardia,R. ( IBM Microelectronics Div. )
Warner,D.J.
Chen,Z.
Stetter,M.
Ferguson,R.A.
McGuire,A.E.
Badger,K.D.
2 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part2
Page(from):
952
Page(to):
961
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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