Deducing aerial image behavior from AIMS data

Deducing aerial image behavior from AIMS data

Author(s):

Gordon,R.L. ( Motorola(USA)and International SEMATECH )
Flagello,D.G.
McCallum,M.

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part1

Page(from):

734

Page(to):

743

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings Lithographic lens testing:analysis of measured aerial images,interferometric data,and photoresist measurements Flagello,D.G., Geh,B. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Impact of coma on CD control for multiphase PSM designs Schmidt,R.T., Spence,C.A., Capodieci,L., Krivokapic,Z., Geh,B., Flagello,D.G. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Mask topography effects in low k1 lithography McCallum,M., Gordon,R.L. SPIE - The International Society for Optical Engineering	8 Conference Proceedings New aspects on the interpretation of Z-scan data McLean,D.G., Fleitz,P.A., Sutherland,R.L. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Exact computation of scalar 2D aerial imagery Gordon, R.L. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Impact of wavefront errors on low k1 processes at extremely high NA Graeupner, P., Garreis, R.B., Goehnermeier, A., Heil, T., Lowisch, M., Flagello, D.G. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Influence of photoresist on the optical performance of high NA-steppers D.G. Flagello, R. Rogoff Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Forbidden pitches for 130-nm lithography and below Socha,R.J., Dusa,M.V., Capodieci,L., Finders,J., Chen,J.F., Flagello,D.G., Cummings,K.D. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Toward a comprehensive control of full-field image quality in optical photolithography Flagello,D.G., Klerk,J.de, Davies,G., Rogoff,R., Geh,B., Arnz,M., Wegmann,U., Kraemer,M. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Can DUV take us below 100 nm? Finders,J., Jorritsma,L., Eurlings,M., Moerman,R., Greevenbroek,H.van, Schoot,J.B.van, Flagello,D.G., Socha,R.J., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings CD control for two-dimensional features in future technology nodes Verhaegen,S., Gordon,R.L., Jonckheere,R.M., McCallum,M., Ronse,K. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12