New pattern generation system based on i-line stepper:photomask repeater
- Author(s):
Kyoh,S. ( Toshiba Corp. ) lnoue,S. Higashikawa,I. Mori,I. Okumura,K. Irie,N. Muramatsu,K. Magome,N. - Publication title:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4000
- Pub. Year:
- 2000
- Vol.:
- Part1
- Page(from):
- 647
- Page(to):
- 657
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- Language:
- English
- Call no.:
- P63600/4000
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
An investigation of a new generation of progressive mask defects on the pattern side of advanced photomasks [5853-13]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Photomask repeater strategy for high-quality and low-cost reticle fabrication
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |