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Advances in 193-nm lithography tools

Author(s):
Cote,D.R. ( SVG Lithography Systems,Inc. )
Ahouse,D.
Galburt,D.N.
Harrold,H.
Kreuzer,J.
Nelson,M.
Oskotsky,M.L.
O'Connor,G.
Sewell,H.
Williamson,D.M.
Zimmerman,J.D.
Zimmerman,R.
7 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part1
Page(from):
542
Page(to):
550
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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