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Process performance comparisons on 300-mm i-line steppers,DUV stepper,and DUV scanners

Author(s):
Schedel,T. ( Semiconductor300 GmbH )
Charles,A.B.
Ganz,D.
Hornig,S.R.
Hraschan,G.
Kostler,W.
Maltabes,J.G.
Mautz,K.E.
Metzdorf,T.
Otto,R.
Schmidt,S.
Schuster,R.
7 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part1
Page(from):
335
Page(to):
342
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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