Alt-PSM for 0.10-ヲフm and 0.13-ヲフm polypatterning
- Author(s):
- Schenker,R.E. ( Intel Corp. )
- Kirchauer,H.
- Stivers,A.R.
- Tejnil,E.
- Publication title:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4000
- Pub. Year:
- 2000
- Vol.:
- Part1
- Page(from):
- 112
- Page(to):
- 120
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- Language:
- English
- Call no.:
- P63600/4000
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
ArF step-and-scan exposure system for 0.15-ヲフm and 0.13-ヲフm technology nodes
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Practical technology path to sub-0.10-ヲフm process generations via enhanced optical lithography
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
8
Conference Proceedings
Prediction of CMOS transistor performance at 0.10-ヲフm gate length using tuned simulations
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-ヲフm reticle fabrication
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Comparison study for sub-0.13-ヲフm lithography between ArF and KrF lithography
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Effective OPC pattern generation using chemically amplified resist 0.13-ヲフm design rule masks
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
0.13-ヲフm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
SPIE - The International Society for Optical Engineering |