Anisotropic plasma etching of barium-strontium-titanate thin films for 4 Gbit DRAM devices

Anisotropic plasma etching of barium-strontium-titanate thin films for 4 Gbit DRAM devices

Author(s):

Publication title:

Ferroelectric thin films VIII : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

596

Pub. Year:

2000

Page(from):

109

Pub. info.:

Warrendale, PA: MRS-Materials Research Society

ISSN:

02729172

ISBN:

9781558995048 [1558995048]

Language:

English

Call no.:

M23500/596

Type:

Conference Proceedings

Details

TDL ID:	ZA00019433
Series ID:	PA00000011
Conf. info. (Name):	Ferroelectric Thin Films : Symposium
Conf. info. (Number):	8th
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1999.11.29-1999.12.02

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