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In Situ X-ray Microbeam Cu Fluorescence and Strain Measurements on Al(0.5 at.% Cu) Conductor Lines During Electromigration

Author(s):
Kao, H-K.
Cargill, G. S., III.
Hwang, K. J.
Ho, A. C.
Wang, P-C.
Hu, C-K.
1 more
Publication title:
Materials reliability in microelectronics IX : symposium held April 6-8, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
563
Pub. Year:
1999
Page(from):
163
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994706 [155899470X]
Language:
English
Call no.:
M23500/563
Type:
Conference Proceedings

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