Blank Cover Image

Micromachined sensor for in-situ monitoring of wafer state in plasma etching

Author(s):
Publication title:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2876
Pub. Year:
1996
Page(from):
98
Page(to):
106
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422743 [0819422746]
Language:
English
Call no.:
P63600/2876
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Oxide Etching in Inductively Coupled Fluorocarbon Plasmas

Schaepkens, M., Oehrlein, G.S.

Electrochemical Society
7 Conference Proceedings Solid-State Electrochemical Sensor for Monitoring Mg in Al Refining Process

G.M. Kale, K.T. Jacob, L. Wang, Y. Hong

Electrochemical Society
2 Conference Proceedings Rapid Scan Spectral Ellipsometry for In Situ Real-Time Wafer State Monitoring

Duncan, W.M., Henck, S.A., Kuehne, J.W., Loewenstein, L.M., Maung, S.

Electrochemical Society
8 Conference Proceedings X-ray emission from colliding laser plasmas

M.D. Wilke, A.W. Obst, D. Winske, M.E. Jones, S.A. Baker

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings In-situ health monitoring of a bonded composite patch using the strain ratio technique

Moss,S.D., Galea,S.C., Powlesland,I.G., Konak,M.J., Baker,A.A.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Feedback Control of Plasma Etching

Christofides, Panagiotis D., Baker, James

American Institute of Chemical Engineers
4 Conference Proceedings High-Density Plasma Etching of Low-Dielectric Constant Materials

Standaert, T. E. F. M., Matsuo, P. J., Allen, S. D., Oehrlein, G. S., Dalton, T. J., Lu, T.-M., Gutmann, R.

MRS - Materials Research Society
10 Conference Proceedings KINETIC OF PLASMA ETCHING SILICON WITH NITROGEN TRIFLOURIDE

Sterger, Harvey Jr. G, Akiki, G.S.

Materials Research Society
5 Conference Proceedings "Proposed approach for combining distributed sensing, robotic sampling, and offline analysis for in-situ marine monitoring"

Sukhatme,G.S., Estrin,D., Caron,D., Mataric,M.J., Requicha,A.A.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Micromachined confocal optical microscope

Dickensheets,D.L., Kino,G.S.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings In-situ ammonia analyzer for process control and environmental monitoring

Monlux,G., Brand,J.A., Zmarzly,P., Walker,M., Groff,K.W., Fetzer,G.J., Goldstein,N., Bien,F., Richtsmeier,S.C., Lee,J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Cmparison of Etching Plasmas for Deep Trench Silicon Etch Process

Ranade, R., Mathad, G.S.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12