Bilayer resist approach for 193-nm lithography
- Author(s):
- Schaedeli,U.P. ( Ciba-Geigy Ltd. )
- Tinguely,E.
- Blakeney,A.J.
- Falcigno,P.A.
- Kunz,R.R.
- Publication title:
- Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2724
- Pub. Year:
- 1996
- Page(from):
- 344
- Page(to):
- 354
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421005 [0819421006]
- Language:
- English
- Call no.:
- P63600/2724
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Thermal stability of silicon-containing methacrylate-based bilayer resist for 193-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
American Chemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |