Halation reduction for single-layer DUV resist processing
- Author(s):
Yoshino,H. ( NEC Corp. ) Itani,T. Hashimoto,S. Yamana,M. Samoto,N. Kasama,K. - Publication title:
- Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2724
- Pub. Year:
- 1996
- Page(from):
- 216
- Page(to):
- 226
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421005 [0819421006]
- Language:
- English
- Call no.:
- P63600/2724
- Type:
- Conference Proceedings
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