Quarter-and subquarter-micron deep-UV lithography with chemically amplified positive resist
- Author(s):
Onishi,Y. ( Toshiba Corp. ) Sato,K. Chiba,K. Asano,M. Niki,H. Hayase,R.H. Hayashi,T. - Publication title:
- Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2724
- Pub. Year:
- 1996
- Page(from):
- 70
- Page(to):
- 81
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421005 [0819421006]
- Language:
- English
- Call no.:
- P63600/2724
- Type:
- Conference Proceedings
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